Technology
01
The Breakthrough
AXIOMERA has developed a new technique for depositing high purity films at an atomic level.
The technology is based on the well-established Atomic Layer Deposition (ALD) technology combine with an new feature of Functional and selective deposition.
Functional Atomic Layer Decposition (FALD) is our proprietary technology that offers the ability to deposit nano films in micro level patterns, without the needs of additional techniques (e.g. lithography, etching, etc...) that may damage the quality and purity of the deposited films.
02
Benefits
FALD enables to deposit high quality nano layers for longer coherence times, higher yields, and high reproducibility for high-performance quantum devices.
03
Sustainability
AxiomEra’s Functional ALD (FALD) technology introduces selective, functional deposition—targeting only the surfaces where material is needed. This precision eliminates the waste associated with conventional ALD and other deposition methods
04
Partnership
We’re seeking visionary partners in academia, research, and industry to explore how our technology can advance your work and applications. Share your perspective, and let’s build the future together.